Published date: 23 December 2016
Closed opportunity - This means that the contract is currently closed. The buying department may be considering suppliers that have already applied, or no suitable offers were made.
Contract summary
Industry
Laboratory, optical and precision equipments (excl. glasses) - 38000000
Location of contract
BS8 1TL
Value of contract
£180,000
Procurement reference
tender_134494/557605
Published date
23 December 2016
Closing date
30 January 2017
Contract start date
20 February 2017
Contract end date
19 February 2022
Contract type
Supply contract
Procedure type
Open procedure
Any interested supplier may submit a tender in response to an opportunity notice.
Contract is suitable for SMEs?
Yes
Contract is suitable for VCSEs?
No
Description
We want to acquire a Plasma-Enhanced Chemical Vapour Deposition (PECVD) system. Your proposed System should be able to deposit thin films of silicon oxide, silicon nitride, combinations of both (silicon oxynitride) and also amorphous silicon. Your proposed System will be located in a class 10000 cleanroom space and will be operated by students and technical staff. Your proposed System should integrate smoothly with the existing facilities without any prejudice for the normal operation of the space.
We envisage two main purposes for your proposed System: the deposition of dielectric cladding and mask layers for the fabrication of silicon photonic circuits based on SOI technology and the deposition of amorphous silicon films to be used as the guiding layer for photonic circuits. Your proposed System should excel at uniformity in film thickness and film composition not only over the surface of the samples (typically SOI wafers or pieces between 1cm in area and 6 inches in diameter) but also between consecutive processes on different samples. The metrics used to evaluate the performance will be uniformity, reproducibility, consistent film composition, low stress and low defect density both on accuracy and degree of control.
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Closing: 30 January 2017